SK specialty leads the global etching gas market based on its advanced technological standards.
Among the etching gases, we produce and sell trifluoromethane (CHF3), hexafluoroethane (C2F6), carbon tetrafluoride (CF4), octafluorocyclobutane (C4F8), pentafluoroethane (C2HF5), etc., which has precise etching ability, and will continuously provide various etching solutions.
The etching process of semiconductors and displays is a process of removing the rest except for the required circuit patterns, and the etching gas is used for precision etching to refine the line width of the semiconductor and to implement micro-circuit patterns required for high-resolution displays.
CHF3 is used for etching in the manufacturing process of the display panel.
It is used for semiconductor fine pattern etching.
Carbon tetrafluoride CF4
It is used for oxide film etching.
It provides a high selection ratio for the mask and is used for 3D NAND high aspect ratio etching.
It is used for etching oxide film and nitride film.
We steadily supply high-quality etching gas to the domestic semiconductor market by securing advanced technologies and sourcing products through collaboration with Showa Denko in Japan.
We will lead the etching gas market by preemptively responding to customers' needs and through constant research and development.